Functions and Uses：
1. ATL can produce the semi-bright nickel deposit of columnar structure that free of sulfur and with excellent extension and leveling force.
2. The deposit is suitable for the initial coating of multi-layer nickel system or nickel-chromium electrodeposits. At a certain thickness, the corrosion resistance of the produced deposit of double-nickel-composite got a very good result in the "Coated Chamber corrosion resistance test" and "CASS test".
3. High stability of solution and easy to manage. With the high impurity tolerance, ATL avoids the needs of the regular cleaning.
4. Other semi-bright nickel processes can be easily converted into “ATL semi-light nickel”.
Nickel sulfate 270 ~ 320g / L
Nickel chloride 35 ~ 45g / L
Boric acid 3 8 ~ 45g / L
ATL opener 9 ~ 12 mL / L
ATL-03 leveling agent 0.5 ~ 1.8mL / L
B supplements 0.1 to 0.25 mL / L
62A humectant 2.0 ~ 5.0 mL / L
PH 3.8 to 4.3
Temperature 52 ~ 59 ℃
Anode current density 1 ~ 3 A / dm2
Cathode current density 3 ~ 8A / dm2